1. What is sputtering deposition?

Sputter deposition is a method of depositing thin films by sputtering material from a “target”. Sputtering is a term used to describe the mechanism in which atoms are ejected from the surface of a material when that surface is stuck by sufficiency energetic ions generated by low-pressure gas plasma, usually an argon plasma. The sputtering takes place at a much lower temperature than evaporation. Sputtered atoms ejected into the gas phase in vapor form are not in their thermodynamic equilibrium state and tend to condense on all surfaces in the vacuum chamber including the substrate.

2. Why are thin films important?

There are many useful applications for thin films. We desire to produce properties in a material that are often conflicting in nature if we use one homogeneous material. Semiconductor devices, for example, are fabricated on a thin layer deposited on a semiconductor substrate. The integrated electronic circuits depend on the confinement of electrical charges, which relies on the interfaces between different materials with different electronic properties. There are also many occasions when the properties demanded an engineering application involve features that are different for the surface than that are for the bulk. Depositing metal films and patterning them on the surface are relatively easy to secure electrical connection between semiconductor devices.

3.How does a sputtering system work?

Generally, in sputtering systems ions are generated and directed at a target, then ions sputter targets atoms. The ejected atoms are transported to the substrate and atoms condense and form a thin film. Below image shows the simple schematic of a sputtering system.

Optimization of Tin Selenide Thin Film(SnSe) for Photovoltaic Application

Due to the proper transition of electrons between energy bands, chalcogenides have good electrical and optical properties. Because of the appropriate properties of these materials, their use can be the solution to the problem of energy shortage in various fields. The excellent electronic and optical properties of binary compounds of transition metals(chalcogenides materials) have led many researchers to conduct in-depth research into the application of these compounds in photovoltaic systems and solar cells. Among the binary compounds of the transition metals group, tin selenide (SnSe) due to its special crystalline structure has received much attention in various applications. SnSe is a P-type semiconductor that provides maximum absorption of sunlight in solar cells due to its high absorption coefficient. The SnSe thin film is usually deposited using the thermal evaporation method.

In order to optimize the electronic and optical properties of Tin Selenide(SnSe) Thin Film, many studies have been performed. Recently, Chinese researchers have studied the effect of SnSe thin film thickness and deposition rate by thermal evaporation and obtained the optimal values of these two parameters in order to optimize the optical and electronic properties of photovoltaic cells. In this study, Tin Selenide Thin Film was created using co-evaporation of tin and selenium with 99.999% purity. For details of this research, refer to the link.

Thermal Evaporation Deposition System DTT

The thermal evaporation deposition system DTT model, made by Nanostructure Coatings Company, is equipped with 3 separate evaporation sources, which is very suitable for co-evaporation. The use of a turbo molecular pump in this system and the proper sealed mechanic cause the ultimate pressure of this device can reach to the range of 7*10^-7 Torr, which is a very suitable pressure for the deposition process by thermal evaporation method. For more information about the products of Nanostructure Coatings Company, see the internet address of this company.

Optimization of Tin Selenide Thin Film(SnSe) for Photovoltaic Application

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Optimization of Tin Selenide Thin Film(SnSe) for Photovoltaic Application

Thermal Evaporation Deposition System DTT