1. What is sputtering deposition?

Sputter deposition is a method of depositing thin films by sputtering material from a “target”. Sputtering is a term used to describe the mechanism in which atoms are ejected from the surface of a material when that surface is stuck by sufficiency energetic ions generated by low-pressure gas plasma, usually an argon plasma. The sputtering takes place at a much lower temperature than evaporation. Sputtered atoms ejected into the gas phase in vapor form are not in their thermodynamic equilibrium state and tend to condense on all surfaces in the vacuum chamber including the substrate.

2. Why are thin films important?

There are many useful applications for thin films. We desire to produce properties in a material that are often conflicting in nature if we use one homogeneous material. Semiconductor devices, for example, are fabricated on a thin layer deposited on a semiconductor substrate. The integrated electronic circuits depend on the confinement of electrical charges, which relies on the interfaces between different materials with different electronic properties. There are also many occasions when the properties demanded an engineering application involve features that are different for the surface than that are for the bulk. Depositing metal films and patterning them on the surface are relatively easy to secure electrical connection between semiconductor devices.

3.How does a sputtering system work?

Generally, in sputtering systems ions are generated and directed at a target, then ions sputter targets atoms. The ejected atoms are transported to the substrate and atoms condense and form a thin film. Below image shows the simple schematic of a sputtering system.

Sputter coater | SEM coater |Nanostructured coatings co

About

Nanostructured Coatings Co. (NSC) is a designer and manufacturer of high quality and reliable vacuum coating systems. The company was established in 2005 with the principal objective of supplying economically priced, high quality vacuum deposition systems for universities and research centers.

Mission Goals and Value

Providing our customers and partners with the most efficient and comprehensive solutions on vacuum processing equipment. Achieve incomparable situation in the Middle East and access to the key international markets of HV and UHV equipment through continuous improvement of our products’ performance, providing advanced technological support and improving customer service. We value our reputation and guarantee…

High Vacuum Desk Sputter/Carbon Coater – DSCT

The DSCT is configured as a sputter coater and fiber carbon coater with interchangeable heads in one instrument suitable for Scanning Electron Microscope (SEM) sample preparation.

Desk Sputter/Carbon Coater – DSCR

The DSCR is a compact coating system included both of sputter and so carbon coater. This system is able to sputter noble metals such as gold, palladium, platinum and gold/palladium on non-conductive or poorly conductive specimens and so able to coat carbon film on the samples.

High Vacuum Desk Sputter Coater – DST1-170

The DST1-170 is a compact coating system with ability to coat metals. Uniform thin films with fine-grain sizes are formed in a fast cycle time. The DST1-170 is equipped with a magnetron cathode with diameter of 2 inches.

Sputtering and Thermal Evaporation Coater

VCS100F is a Vacuum Sputtering and Thermal Coating System-it used two cathode magnetron with 3 degrees of freedom adjustment.

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Address : Unit No.14,15 – 4rd Floor – Apartment No.5 – Ghadir St. – Azadi Ave – Tehran – Iran
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High Vacuum Desk Sputter/Carbon Coater – DSCT

Desk Sputter/Carbon Coater – DSCR

High Vacuum Desk Sputter Coater – DST1-170

Sputtering and Thermal Evaporation Coater

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