1. What is sputtering deposition?

Sputter deposition is a method of depositing thin films by sputtering material from a “target”. Sputtering is a term used to describe the mechanism in which atoms are ejected from the surface of a material when that surface is stuck by sufficiency energetic ions generated by low-pressure gas plasma, usually an argon plasma. The sputtering takes place at a much lower temperature than evaporation. Sputtered atoms ejected into the gas phase in vapor form are not in their thermodynamic equilibrium state and tend to condense on all surfaces in the vacuum chamber including the substrate.

2. Why are thin films important?

There are many useful applications for thin films. We desire to produce properties in a material that are often conflicting in nature if we use one homogeneous material. Semiconductor devices, for example, are fabricated on a thin layer deposited on a semiconductor substrate. The integrated electronic circuits depend on the confinement of electrical charges, which relies on the interfaces between different materials with different electronic properties. There are also many occasions when the properties demanded an engineering application involve features that are different for the surface than that are for the bulk. Depositing metal films and patterning them on the surface are relatively easy to secure electrical connection between semiconductor devices.

3.How does a sputtering system work?

Generally, in sputtering systems ions are generated and directed at a target, then ions sputter targets atoms. The ejected atoms are transported to the substrate and atoms condense and form a thin film. Below image shows the simple schematic of a sputtering system.

Iran Nano 2018 - NanoStructured Coatings Co.

The initial spark of nanotechnology in Iran was struck in 2000 when the Nanotechnology Policy Studies Committee was formed. In the fall of 2003, Iran Nanotechnology Initiative Council (INIC) officially was established, inspired by the national leadership nanotechnology programs in many countries around the world. The strategic plan of nanoscience and technology provides the outline of nationwide activities in this field from 2005 to 2015. This was called “The Future Strategy”, which was approved by the government cabinet in July 2005, and explains the vision of nano-science and technology development of Iran. The vision is the following: “For materialization of the twenty year vision of the Islamic Republic of Iran, the software movement and the improvement of level, quality and security of people’s life, in a ten year period, the Islamic Republic of Iran will be a developed country in terms of nanotechnology with the following:

Local advanced infra-structures and enjoying higher share of expert human resources
Having effective and constructive internal and international interactions
Generator of economic added value resulting from nanotechnology
Enjoying competition capability at global level”